LEC published in MICROmanufacturing magazine
LEC Plasma Science Group featured in published article for MICROmanufacturing magazine.
by
Ben John Newton
Machine aims to quiet EUV lithography critics
Is extreme ultraviolet (EUV) lithography almost ready to silence the skeptics who question whether the technology can meet required chip-production levels? Yes, reports a major supplier of semiconductor manufacturing equipment.
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Published in: external page MICRO manufacturing