LEC published in MICROmanufacturing magazine

LEC Plasma Science Group featured in published article for MICROmanufacturing magazine.

by Ben John Newton

Machine aims to quiet EUV lithography critics

Is extreme ultraviolet (EUV) lithography almost ready to silence the skeptics who question whether the technology can meet required chip-production levels? Yes, reports a major supplier of semiconductor manufacturing equipment.

DownloadRead full article (PDF, 562 KB)

Published in: external pageMICRO manufacturing

JavaScript has been disabled in your browser